Solar cell wafer etching (Edge Isolation)

Solar cells (PV cells) convert sunlight directly into electricity and form the core of solar panels. Edge isolation reduces edge-related current loss, improving efficiency. Plasma cleaning and vacuum sputtering are advanced techniques used to optimize edge isolation and enhance cell and panel performance.

Atmospheric Pressure Plasma SAP006

Under atmospheric conditions, organic contaminants are rapidly removed Achieves effective surface cleaning and modification, significantly improving the reliability of component packaging, adhesion, and printing.

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Atmospheric Pressure Plasma SAP009SA

Spot type AP plasma, SAP009, was designed for low power (up to 120W) application with energy saving purpose. We combine plasma generator and plasma head to become a compact plasma tool. Combine with XY table it become a simple, low cost, AP plasma machine.

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Plasma Etching Machine PI01

Designed for solar cell manufacturing, specifically for edge etching of silicon wafers.

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Plasma Pulsed DC Power Supply PDPS001

Creating Nano’s fully automatic PDPS Pulse DC plasma power series microprocessor controller was specially designed to support plasma equipment to maintain the uniform operation. The cutting edge arc protection mechanism will effectively withstand all kinds of overloads.

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