LP Treatment Series
Plasma Etching Machine PI01
Production Description
Designed for solar cell manufacturing, specifically for edge etching of silicon wafers.
Product Features
- Patented design with specialized plasma electrodes
- High-density plasma source
- Fast processing speed, high throughput, and high reliability
- Wide range of selectable operating parameters
- High equipment stability and easy maintenance
- Fully automated and user-friendly operation
- Customizable according to customer requirements